That's the traditional course of action. As long as it's financially sound they will at least try it.

At that point making smaller patterns might not be the biggest issue. Vias are becoming s bottleneck and proven to be hard to scale down. If we cannot fibd a new way to open vias reliably and with low resistence it will be bottleneck for scaling down.

Yeah but then it's a bit the end of the road, since there are no workable refractive media for EUV, not even on paper, which categorically rules out higher NA optics, which was half the reason for why ArF was able to be used for about 20 years.